WebWe work closely with the semiconductor industry to develop and apply measurements with high-spatial and chemically-specific resolution to elucidate the critical materials properties and process kinetics at …
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WebMar 16, 2015 · It is important to control the dose/defocus in the EUV photolithography under proper status to make sure the CD and shape meeting the fine and strict … The fundamental design principle of the soft photomask is to provide a conformal contact on photoresist surface while containing a binary amplitude pattern that is similar to conventional chromium-glass photomask. These requirements could be met by embedding a metal absorber in the soft substrate. Several … See more In order to ensure that the Cr patterns embedded in PDMS were intact after the mask fabrication procedure, we used optical microscopy to obtain images of the soft photomask with Cr dot (Fig. 2a) and line patterns … See more In order to investigate the image transfer properties of the soft photomask, it was brought into contact with a silicon substrate that was pre-coated with a positive photoresist … See more We explored multiple patterning capability of soft photomask with several representative applications to verify its relevance as a generic pattern transfer tool. First, we … See more To test the capability of our soft photomask in creating structures on the surface with curvature, we used our soft photomask to create photoresist patterns on a Teflon surface … See more from 53
Photolithography - SlideShare
WebFEM) Maximum process rectangle that contains CDs and sidewall angles meeting the specified criteria. The Exposure latitude is taken as the height of the rectangle and the … WebApr 4, 2005 · Therefore, in the present research, various tuning fork design parameters and their levels have been laid out by well-known Taguchi's design of experiment method [24].Design parameters for FEM analysis are schematically illustrated in Fig. 5 and are listed along with levels according to L 27 (3 13) matrix of Taguchi's method [24] in Table 1.In … WebOptical lithography (also known as photolithography) is a technique based on transferring a pattern from a mask to a surface using a radiation source, such as visible UV light or X … from 50 to 90